Fabrication of Back-Channel-Etched Bottom-Gate Amorphous-InGaZnO Thin Film Transistors
碩士 === 國立臺灣大學 === 光電工程學研究所 === 98 === The back-channel-etched (BCE)-type bottom-gate thin film transistor (TFT) structure is the most desired one for the rapidly growing oxide TFT technology due to merits such as simplicity, low cost, ease of device scaling, and compatibility with the existed main-s...
Main Authors: | Chia-Hsin Liao, 廖家欣 |
---|---|
Other Authors: | Chung-Chih Wu |
Format: | Others |
Language: | zh-TW |
Published: |
2010
|
Online Access: | http://ndltd.ncl.edu.tw/handle/38739772329596413275 |
Similar Items
-
Effect of Oxygen Content on Current Stress-Induced Instability in Bottom-Gate Amorphous InGaZnO Thin-Film Transistors
by: Sungju Choi, et al.
Published: (2019-09-01) -
Transparent thin film transistors fabricated by amorphous InGaZnO4 thin films
by: Wen-Yuan Ma, et al.
Published: (2006) -
Fabrication and Characterization of Amorphous InGaZnO Thin-Film and Metal-Base Transistors
by: Hau-YuanHuang, et al.
Published: (2014) -
Interface Improvement Thin-Film Transistors with Amorphous Mg-InGaZnO/InGaZnO AP-PECVD Fabricated Channel Structure
by: Kuo, Jui-Lin, et al.
Published: (2019) -
Amorphous InGaZnO thin-film transistor with La-based high-k gate dielectric
by: Qian, Lingxuan, et al.
Published: (2014)