Effects of Stacked High-k Blocking Layer on Charge-Trapping Flash Memory Devices

碩士 === 國立清華大學 === 工程與系統科學系 === 98 === When floaging gate device can't satisfy smaller device, SONOS-Type is the one of candidate to replace it. SONOS-Type device tunneling layer thickness is about 30A ,it is a problem for retention. How to improve our device performance is very important. In ou...

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Bibliographic Details
Main Authors: Shiu, Feng-Wen, 許逢文
Other Authors: Chang-Liao, Kuei-Shu
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/09742273730644922957

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