Factors and Influence of Boron Atoms Activation in Si1-xGex (x<0.1) Thin Film Using Scanning Capacitance Microscopy
碩士 === 國立清華大學 === 工程與系統科學系 === 98
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2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/v44y63 |
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ndltd-TW-098NTHU5593023 |
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ndltd-TW-098NTHU55930232019-05-15T20:32:41Z http://ndltd.ncl.edu.tw/handle/v44y63 Factors and Influence of Boron Atoms Activation in Si1-xGex (x<0.1) Thin Film Using Scanning Capacitance Microscopy 利用掃描電容顯微鏡研究Si1-xGex(x<0.1)薄膜中對硼原子活化之因素及影響 Kuok, Kun-Wa 郭觀華 碩士 國立清華大學 工程與系統科學系 98 Liang, Jenq-Horng Chang, Mao-Nan 梁正宏 張茂男 2010 學位論文 ; thesis 66 zh-TW |
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NDLTD |
| language |
zh-TW |
| format |
Others
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NDLTD |
| description |
碩士 === 國立清華大學 === 工程與系統科學系 === 98 |
| author2 |
Liang, Jenq-Horng |
| author_facet |
Liang, Jenq-Horng Kuok, Kun-Wa 郭觀華 |
| author |
Kuok, Kun-Wa 郭觀華 |
| spellingShingle |
Kuok, Kun-Wa 郭觀華 Factors and Influence of Boron Atoms Activation in Si1-xGex (x<0.1) Thin Film Using Scanning Capacitance Microscopy |
| author_sort |
Kuok, Kun-Wa |
| title |
Factors and Influence of Boron Atoms Activation in Si1-xGex (x<0.1) Thin Film Using Scanning Capacitance Microscopy |
| title_short |
Factors and Influence of Boron Atoms Activation in Si1-xGex (x<0.1) Thin Film Using Scanning Capacitance Microscopy |
| title_full |
Factors and Influence of Boron Atoms Activation in Si1-xGex (x<0.1) Thin Film Using Scanning Capacitance Microscopy |
| title_fullStr |
Factors and Influence of Boron Atoms Activation in Si1-xGex (x<0.1) Thin Film Using Scanning Capacitance Microscopy |
| title_full_unstemmed |
Factors and Influence of Boron Atoms Activation in Si1-xGex (x<0.1) Thin Film Using Scanning Capacitance Microscopy |
| title_sort |
factors and influence of boron atoms activation in si1-xgex (x<0.1) thin film using scanning capacitance microscopy |
| publishDate |
2010 |
| url |
http://ndltd.ncl.edu.tw/handle/v44y63 |
| work_keys_str_mv |
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