氮化鋯薄膜於真空及氮氣環境之氧化行為研究
碩士 === 國立清華大學 === 工程與系統科學系 === 98 === The objective of this study is to understand the difference of the behaviors of ZrN thin film oxidation in different atmospheres. The annealing atmosphere and temperature were chosen to be the designate variables. In this study, ZrN thin film was deposited on Si...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/52955332252071868463 |