Pressure influence on the rapid thermal annealing of implanted Si(111) studied by reflective second harmonic generation
碩士 === 國立嘉義大學 === 光電暨固態電子研究所 === 98 === Reflective second harmonic generation (RSHG) is a surface sensitive tool for analyzing the recrystallization phenomenon of implanted Si(111). In this work, the behavior of P dopants at varied chamber pressure would be discussed by RSHG results. In the...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/44814823140198885938 |