Fabrication of Micro/Nano patterns with EWOD Actuation
碩士 === 國立中央大學 === 光電科學研究所 === 98 === Nanotechnology has become as the mainstream technology in the twenty-first century. Especially, the micro/nano patterning technology is also under rapid development to the needs of the various functional elements. However, the micro-fabrication technology, which...
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ndltd-TW-098NCU056140272016-04-20T04:17:47Z http://ndltd.ncl.edu.tw/handle/17011653864418173049 Fabrication of Micro/Nano patterns with EWOD Actuation 電濕式驅動系統應用於微奈米級圖樣之製作 Guo-Teng Hong 洪國騰 碩士 國立中央大學 光電科學研究所 98 Nanotechnology has become as the mainstream technology in the twenty-first century. Especially, the micro/nano patterning technology is also under rapid development to the needs of the various functional elements. However, the micro-fabrication technology, which is critical lithography for pattern transferring, is getting more difficult. In optic lithography, the diffraction makes it not easy to obtain the patterns with the fine structures in the nanometer scale. Moreover, the light sources for optical lithography are extremely expensive. Therefore, it is an urgent and interesting subject to develop a new process of high resolution in micro/nano-scale but convenient to implement and not expensive in cost. In this thesis, it is proposed to integrate the electrowetting on dielectric (EWOD) actuation and the nanosphere lithography (NSL). Finally, the application of practical fabrication has also been demonstrated with aids of the soft lithography and the self-assembled monolayer (SAM). Tsung-Hsun Yang 楊宗勳 2010 學位論文 ; thesis 62 zh-TW |
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碩士 === 國立中央大學 === 光電科學研究所 === 98 === Nanotechnology has become as the mainstream technology in the twenty-first century. Especially, the micro/nano patterning technology is also under rapid development to the needs of the various functional elements. However, the micro-fabrication technology, which is critical lithography for pattern transferring, is getting more difficult. In optic lithography, the diffraction makes it not easy to obtain the patterns with the fine structures in the nanometer scale. Moreover, the light sources for optical lithography are extremely expensive. Therefore, it is an urgent and interesting subject to develop a new process of high resolution in micro/nano-scale but convenient to implement and not expensive in cost. In this thesis, it is proposed to integrate the electrowetting on dielectric (EWOD) actuation and the nanosphere lithography (NSL). Finally, the application of practical fabrication has also been demonstrated with aids of the soft lithography and the self-assembled monolayer (SAM).
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Tsung-Hsun Yang |
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Tsung-Hsun Yang Guo-Teng Hong 洪國騰 |
author |
Guo-Teng Hong 洪國騰 |
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Guo-Teng Hong 洪國騰 Fabrication of Micro/Nano patterns with EWOD Actuation |
author_sort |
Guo-Teng Hong |
title |
Fabrication of Micro/Nano patterns with EWOD Actuation |
title_short |
Fabrication of Micro/Nano patterns with EWOD Actuation |
title_full |
Fabrication of Micro/Nano patterns with EWOD Actuation |
title_fullStr |
Fabrication of Micro/Nano patterns with EWOD Actuation |
title_full_unstemmed |
Fabrication of Micro/Nano patterns with EWOD Actuation |
title_sort |
fabrication of micro/nano patterns with ewod actuation |
publishDate |
2010 |
url |
http://ndltd.ncl.edu.tw/handle/17011653864418173049 |
work_keys_str_mv |
AT guotenghong fabricationofmicronanopatternswithewodactuation AT hóngguóténg fabricationofmicronanopatternswithewodactuation AT guotenghong diànshīshìqūdòngxìtǒngyīngyòngyúwēinàimǐjítúyàngzhīzhìzuò AT hóngguóténg diànshīshìqūdòngxìtǒngyīngyòngyúwēinàimǐjítúyàngzhīzhìzuò |
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1718228386692726784 |