Fabrication of Micro/Nano patterns with EWOD Actuation

碩士 === 國立中央大學 === 光電科學研究所 === 98 === Nanotechnology has become as the mainstream technology in the twenty-first century. Especially, the micro/nano patterning technology is also under rapid development to the needs of the various functional elements. However, the micro-fabrication technology, which...

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Main Authors: Guo-Teng Hong, 洪國騰
Other Authors: Tsung-Hsun Yang
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/17011653864418173049
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spelling ndltd-TW-098NCU056140272016-04-20T04:17:47Z http://ndltd.ncl.edu.tw/handle/17011653864418173049 Fabrication of Micro/Nano patterns with EWOD Actuation 電濕式驅動系統應用於微奈米級圖樣之製作 Guo-Teng Hong 洪國騰 碩士 國立中央大學 光電科學研究所 98 Nanotechnology has become as the mainstream technology in the twenty-first century. Especially, the micro/nano patterning technology is also under rapid development to the needs of the various functional elements. However, the micro-fabrication technology, which is critical lithography for pattern transferring, is getting more difficult. In optic lithography, the diffraction makes it not easy to obtain the patterns with the fine structures in the nanometer scale. Moreover, the light sources for optical lithography are extremely expensive. Therefore, it is an urgent and interesting subject to develop a new process of high resolution in micro/nano-scale but convenient to implement and not expensive in cost. In this thesis, it is proposed to integrate the electrowetting on dielectric (EWOD) actuation and the nanosphere lithography (NSL). Finally, the application of practical fabrication has also been demonstrated with aids of the soft lithography and the self-assembled monolayer (SAM). Tsung-Hsun Yang 楊宗勳 2010 學位論文 ; thesis 62 zh-TW
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description 碩士 === 國立中央大學 === 光電科學研究所 === 98 === Nanotechnology has become as the mainstream technology in the twenty-first century. Especially, the micro/nano patterning technology is also under rapid development to the needs of the various functional elements. However, the micro-fabrication technology, which is critical lithography for pattern transferring, is getting more difficult. In optic lithography, the diffraction makes it not easy to obtain the patterns with the fine structures in the nanometer scale. Moreover, the light sources for optical lithography are extremely expensive. Therefore, it is an urgent and interesting subject to develop a new process of high resolution in micro/nano-scale but convenient to implement and not expensive in cost. In this thesis, it is proposed to integrate the electrowetting on dielectric (EWOD) actuation and the nanosphere lithography (NSL). Finally, the application of practical fabrication has also been demonstrated with aids of the soft lithography and the self-assembled monolayer (SAM).
author2 Tsung-Hsun Yang
author_facet Tsung-Hsun Yang
Guo-Teng Hong
洪國騰
author Guo-Teng Hong
洪國騰
spellingShingle Guo-Teng Hong
洪國騰
Fabrication of Micro/Nano patterns with EWOD Actuation
author_sort Guo-Teng Hong
title Fabrication of Micro/Nano patterns with EWOD Actuation
title_short Fabrication of Micro/Nano patterns with EWOD Actuation
title_full Fabrication of Micro/Nano patterns with EWOD Actuation
title_fullStr Fabrication of Micro/Nano patterns with EWOD Actuation
title_full_unstemmed Fabrication of Micro/Nano patterns with EWOD Actuation
title_sort fabrication of micro/nano patterns with ewod actuation
publishDate 2010
url http://ndltd.ncl.edu.tw/handle/17011653864418173049
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