Highly stable and efficient amorphous silicon thin film solar cell
碩士 === 國立交通大學 === 顯示科技研究所 === 98 === This article introduce that we utilize high density plasma chemical vapor deposition (HDPCVD) to develop low cost, low temperature, high quality silicon thin film deposition technique and high efficiency flexible amorphous silicon thin film solar cell. At first,...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/44067157285287763119 |