I-Ching Decision Making Model Applied to Taiwan Semiconductor Photolithography R&D Strategy Selection for 22 nm Generation and Beyond

碩士 === 國立交通大學 === 高階主管管理碩士學程 === 98 === Lithography process is the most critical path to enter the next generation, especially for 22nm HP generation. However, expensive advanced equipments and high R&D costs make the rapid growth of actual total cost while adopting advanced technologies for ne...

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Main Authors:	Lin, Benjamin Szu-Min, 林思閩
Other Authors:	Ding, Cherng G.
Format:	Others
Language:	zh-TW
Published:	2010
Online Access:	http://ndltd.ncl.edu.tw/handle/35397158066096082559

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spelling	ndltd-TW-098NCTU56270252016-04-18T04:21:31Z http://ndltd.ncl.edu.tw/handle/35397158066096082559 I-Ching Decision Making Model Applied to Taiwan Semiconductor Photolithography R&D Strategy Selection for 22 nm Generation and Beyond 易經決策模式應用於台灣半導體產業22奈米世代以下黃光微影關鍵製程技術之研發策略選擇 Lin, Benjamin Szu-Min 林思閩碩士國立交通大學高階主管管理碩士學程 98 Lithography process is the most critical path to enter the next generation, especially for 22nm HP generation. However, expensive advanced equipments and high R&D costs make the rapid growth of actual total cost while adopting advanced technologies for next generation. Uncertainties and multiple technology choices also increase R&D costs and time to market. Therefore, selecting an optimum lithographic technology to meet R&D cost reduction, provide new technology to customers in time, and increase technology competence efficiently is an important topic for Taiwanese semiconductor industry. In this study, I-Ching decision making model: “The Equilibrium Transformation among Mind, Recognition and Resource”, developed by Chair Prof. H. L. Li from NCTU, and I-Ching Cube, described in this work about special 3-D arrangement and energy states for 64 double-trigrams in a 4x4x4 cube, would be implemented to explain how to select the best lithographic solution to 22nm HP generation for Taiwanese semiconductor makers. Ding, Cherng G. 丁承 2010 學位論文 ; thesis 56 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	碩士 === 國立交通大學 === 高階主管管理碩士學程 === 98 === Lithography process is the most critical path to enter the next generation, especially for 22nm HP generation. However, expensive advanced equipments and high R&D costs make the rapid growth of actual total cost while adopting advanced technologies for next generation. Uncertainties and multiple technology choices also increase R&D costs and time to market. Therefore, selecting an optimum lithographic technology to meet R&D cost reduction, provide new technology to customers in time, and increase technology competence efficiently is an important topic for Taiwanese semiconductor industry. In this study, I-Ching decision making model: “The Equilibrium Transformation among Mind, Recognition and Resource”, developed by Chair Prof. H. L. Li from NCTU, and I-Ching Cube, described in this work about special 3-D arrangement and energy states for 64 double-trigrams in a 4x4x4 cube, would be implemented to explain how to select the best lithographic solution to 22nm HP generation for Taiwanese semiconductor makers.
author2	Ding, Cherng G.
author_facet	Ding, Cherng G. Lin, Benjamin Szu-Min 林思閩
author	Lin, Benjamin Szu-Min 林思閩
spellingShingle	Lin, Benjamin Szu-Min 林思閩 I-Ching Decision Making Model Applied to Taiwan Semiconductor Photolithography R&D Strategy Selection for 22 nm Generation and Beyond
author_sort	Lin, Benjamin Szu-Min
title	I-Ching Decision Making Model Applied to Taiwan Semiconductor Photolithography R&D Strategy Selection for 22 nm Generation and Beyond
title_short	I-Ching Decision Making Model Applied to Taiwan Semiconductor Photolithography R&D Strategy Selection for 22 nm Generation and Beyond
title_full	I-Ching Decision Making Model Applied to Taiwan Semiconductor Photolithography R&D Strategy Selection for 22 nm Generation and Beyond
title_fullStr	I-Ching Decision Making Model Applied to Taiwan Semiconductor Photolithography R&D Strategy Selection for 22 nm Generation and Beyond
title_full_unstemmed	I-Ching Decision Making Model Applied to Taiwan Semiconductor Photolithography R&D Strategy Selection for 22 nm Generation and Beyond
title_sort	i-ching decision making model applied to taiwan semiconductor photolithography r&d strategy selection for 22 nm generation and beyond
publishDate	2010
url	http://ndltd.ncl.edu.tw/handle/35397158066096082559
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I-Ching Decision Making Model Applied to Taiwan Semiconductor Photolithography R&D Strategy Selection for 22 nm Generation and Beyond

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