I-Ching Decision Making Model Applied to Taiwan Semiconductor Photolithography R&D Strategy Selection for 22 nm Generation and Beyond
碩士 === 國立交通大學 === 高階主管管理碩士學程 === 98 === Lithography process is the most critical path to enter the next generation, especially for 22nm HP generation. However, expensive advanced equipments and high R&D costs make the rapid growth of actual total cost while adopting advanced technologies for ne...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/35397158066096082559 |