I-Ching Decision Making Model Applied to Taiwan Semiconductor Photolithography R&D Strategy Selection for 22 nm Generation and Beyond

碩士 === 國立交通大學 === 高階主管管理碩士學程 === 98 === Lithography process is the most critical path to enter the next generation, especially for 22nm HP generation. However, expensive advanced equipments and high R&D costs make the rapid growth of actual total cost while adopting advanced technologies for ne...

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Bibliographic Details
Main Authors: Lin, Benjamin Szu-Min, 林思閩
Other Authors: Ding, Cherng G.
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/35397158066096082559
Description
Summary:碩士 === 國立交通大學 === 高階主管管理碩士學程 === 98 === Lithography process is the most critical path to enter the next generation, especially for 22nm HP generation. However, expensive advanced equipments and high R&D costs make the rapid growth of actual total cost while adopting advanced technologies for next generation. Uncertainties and multiple technology choices also increase R&D costs and time to market. Therefore, selecting an optimum lithographic technology to meet R&D cost reduction, provide new technology to customers in time, and increase technology competence efficiently is an important topic for Taiwanese semiconductor industry. In this study, I-Ching decision making model: “The Equilibrium Transformation among Mind, Recognition and Resource”, developed by Chair Prof. H. L. Li from NCTU, and I-Ching Cube, described in this work about special 3-D arrangement and energy states for 64 double-trigrams in a 4x4x4 cube, would be implemented to explain how to select the best lithographic solution to 22nm HP generation for Taiwanese semiconductor makers.