Ab initio Chemical Kinetic Studies for Reactions of H-atoms with Silicon Hydrides (SinH2n+2, n=1~2) and Decomposition Reactions of Silicon Hydride Radicals (SinH2n+1, n=1~3)

碩士 === 國立交通大學 === 機械工程學系 === 98 === The reactions of hydrogen atoms with silicon hydrides (SinH2n+2, n=1~2) and the decomposition reactions of silicon hydride radicals (SinH2n+1, n=1~3) are relevant to the understanding of catalytic chemical vapor deposition (Cat-CVD) and plasma enhanced chemical va...

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Bibliographic Details
Main Authors: Wu, Shang-Ying, 吳尚穎
Other Authors: Wu, Jong-Shinn
Format: Others
Language:en_US
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/66016085146857006748