The effect of thermal treatment on the material and nanomechanical properties of epitaxial SiGe thin films

博士 === 國立交通大學 === 機械工程學系 === 98 === Silicon-germanium (SiGe) alloy is one of the most attractive semiconductor materials because of its outstanding behaviors. Since then, SiGe have been applied to heterojunction bipolar transistor (HBT) as well as complementary metal-oxide-semiconductor (CMOS). Howe...

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Bibliographic Details
Main Authors: He, Ching-Bo, 何柏青
Other Authors: Chou, Chang-Pin
Format: Others
Language:en_US
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/01995558229076344705