Investigation of Relationship between the Plasma and Material Characteristics of Zinc Oxide (ZnO) Thin Film by Radio Frequency (RF) Reactive Magnetron Sputtering
博士 === 國立交通大學 === 機械工程學系 === 98 === Zinc oxide (ZnO) thin film was deposited on glass substrate by RF reactive magnetron sputtering. The plasma parameters, structural, chemical, optical and hydrophilic/hydrophobic properties of the film were measured using a Langmuir probe, x-ray diffractometry (XRD...
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| Format: | Others |
| Language: | en_US |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/19073731043445722338 |