Fabrication of Seamless Roller Imprinting Molds Based on Inner Cylindrical Surface Photolithography

• Main Authors: Shr-RenHuang, 黃世仁
• Other Authors: Yung-Chun Lee
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/38234522881915683686

碩士 === 國立成功大學 === 奈米科技暨微系統工程研究所 === 98 === This thesis develops an innovative way of using inner cylindrical surface photolithography to create a seamless roller imprinting mold which can be used to fabricate micro-structure on substrates in a roll-to-roll process. Firstly, a layer of photo-resist (PR) is spin-coated on the inner cylindrical surface of hollow cylinder by an air ring PR coating system. Secondly, a flexible plastic mask in applied for transferring designed patterns to the coated PR layer. In order to achieve seamless pattern transfer, we adopt two kinds of exposure method: one is to repeatedly expose a line-shape pattern step by step by rotating the cylinder with an incremental rotation angle; and another is to expose one pattern with continuous rotating. After the UV exposing process, the hollow cylinder is then thermally baked in the oven. After developing we can obtain a master mold with seamless micro-structures on the inner cylindrical surface. Finally, the patterns and micro-structures are replicated by pouring PDMS solution into the master mold or electroforming a nickel layer. The obtained roller molds can be used in the roll-to-roll imprinting process.