Microwave Characteristics of Porous Low-k SiOCH Film
碩士 === 國立成功大學 === 微電子工程研究所碩博士班 === 98 === As ultra large scale integrated (ULSI) circuits shrink to sub-micron dimensions, the interconnect widths become smaller; therefore, signal propagation delays become a dominant part of the overall chip delay. cross-talk and power consumption greatly increase...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/76063457479057785751 |