Investigation of Silicon-based Thin-Film Solar Cell grown by Laser-assisted Plasma Enhanced Chemical Vapor Deposition

• Main Authors: Tzung-DaLiou, 劉宗達
• Other Authors: Ching-Ting Lee
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/41279273176161650185

碩士 === 國立成功大學 === 微電子工程研究所碩博士班 === 98 === In this work, the laser assisted plasma enhanced chemical vapor deposition technique has been developed to deposit microcrystalline silicon-based ?lms at low temperature. This study investigates the thin films performance of P-type silicon-carbide , I-type silicon and N-type silicon-germanium. The effects of laser assistance on the crystalline structure and bonding characteristics of the deposited ?lms have been explored. The optical energy gap of thin film and electrical properties was measured with the different laser power. In terms of application, the absorption of solar wavelength range was increased in the structure of device with the energy gap gradient. On the other hand, the performances of the amorphous silicon-based solar cells would be degraded under a long term illuminating. Therefore, the laser assisted plasma enhanced chemical vapor deposition technique deposited silicon-based film could supply a better quality of silicon-based thin film as P-I-N layer to overcome this weakness. The research is to achieve this goal. And the characteristics of solar cells were compared finally.