Effects of embedding Au layer on the resistive switching characteristics of NiO memory devices
碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 98 === In this research, nickel oxide(NiO) thin films were deposited by reactive sputtering from nickel(Ni) target. Resistance random access memory(RRAM) devices were fabricated using NiO film without embedded Au layer(Al/NiO/Pt), NiO film without embedded Au laye...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/04981670917424214367 |