Properties of Gas Barrier Thin Film of Silicon Nitride Deposited on Polyimide/Al2O3 Hybrid Substrates by RF Magnetron Sputtering

碩士 === 國立勤益科技大學 === 化工與材料工程系 === 98 === In this study, composite membranes with the function of gas barrier were developed. A silicon nitride (Si3N4) thin film, as a gas barrier layer, was deposited on polyimide (PI) or polyimide/aluminium oxide (PI/Al2O3) hybrid substrates by RF magnetron sputterin...

Full description

Bibliographic Details
Main Authors: Hong-Yi Wang, 王泓羿
Other Authors: Mei-Hui Tsai
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/88588456323193529553