Fabrication and applications of nanopore array on silicon

• Main Authors: Ching-Yu Ho, 何京諭
• Other Authors: 王國禎
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/35146447041909896845

碩士 === 國立中興大學 === 機械工程學系所 === 98 === In this study, a novel method for the fabrication of high aspect ratio silicon nanoporous arrays is developed. At the beginning, the photolithographic process was implemented to pattern micro-porous arrays on an N-type silicon wafer. The pre-etching by KOH was than conducted to produce an inverted pyramid array on the wafer, followed by an anodic etching process to further etch the pores down from the tip of each pyramid. When the etchant penetrates the wafer, a patterned silicon nanoporous array can be obtained. The success of the proposed method can be attributed to two main reasons. (1) The home-made fixture to efficiently expel the etching generated air and promptly hold the back-side illumination light; (2) The using of a new etchant which consists of the hydrofluoric acid and the EtOH and DMSO mixed surfactant to effectively polish the pore surface and sharp the tips of the etched pores. A nanoporous array can thus be fabricated when the etchant penetrates the wafer.