Process and Properties of Ti-B-N Hard Coating Synthesized by Unbalanced Magnetron Sputtering

• Main Authors: Po-lin Huang, 黃柏霖
• Other Authors: Wei-Yo Ho
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/thhukw

碩士 === 明道大學 === 材料科學與工程學系碩士班 === 98 === Synthesis and characterizations of Ti-B-N coating by unbalanced magnetron sputtering system(UBM). The TiBN films were prepared using Ti33B66 target, and change into the varied N2 gas flow with the 0,7,14,21 sccm and the substrate bias voltage at 80,100,120 volts. The Ti-B-N films consisted a Ti interface, and a final TiBN films. SEM, AFM, XRD, XPS, nano-indentation and pin-on-disk tribometer were employed to characterize the mechanical and microstructure. This study focuses on wear resistance to effect of TiBN films by unbalanced magnetron sputtering. These nanocomposites coatings are formed by a mixture phases, which typically consist of nanometer-sized crystals embedded in a preferably matrix which may be BN amorphous and TiN nanocrystalline. Wear tests were carried out using both the pin-on-disk glass balls as the counter-face and have low friction coefficient. Ti–B–N nanocomposites coatings have highpotential for excellent mechanical and structure. Experimental results revealed the suitable application for glass machining process of the Ti-B-N coatings.