Study on the Adjustable Stress of Plasma Enhanced Chemical Vapor Deposition Film by Ion Implantation
碩士 === 國立高雄應用科技大學 === 光電與通訊研究所 === 98 === The objective of this present work is to use ion implantation to adjust stress of plasma enhanced chemical vapor deposition (PECVD) film. The two-dimension suspended structure was design to observe the deformation of membrane. Furthermore, the two-dimension...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/58771777866216817116 |