In-Situ Nitridation of Titanium Monoxide (TiO) Thin Films by Sputtering Deposition and High-Pressure Oxidation Behavior
碩士 === 逢甲大學 === 產業研發碩士班 === 98 === In this thesis thin films of titanium monoxide (TiO) and titanium oxynitride (TiOxNy) were deposited on Corning Eagle 2000 glass substrates under various Ar-O2 and Ar-O2-N2 mixtures, respectively, by uni-polar pulsed DC magnetron sputtering. Each individual film wa...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/36045651256557640592 |