Rapid Inspection for Sub-Wavelength Line-Width
碩士 === 中原大學 === 機械工程研究所 === 98 === This study utilizes bright-field microscope as a measurement system for developing a technique based on the through-focus method. It allows a rapid examination of the grating pitch of wafers and the line-width of nano and below optical diffraction limit sub-wavelen...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/85971916233595066584 |