Study of TixTay-Doped HfLaON on Electrical and Reliability Characteristics of Advanced Metal-Oxide-Semiconductor Capacitors
碩士 === 國立虎尾科技大學 === 機械與機電工程研究所 === 97 === In this thesis, the effects of the nitrogen concentration profiles in the HfLaON gate dielectric on the electrical and reliability properties of metal-oxide-semiconductor (MOS) capacitors were investigated. The nitrogen concentration in HfLaON gate dielectr...
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/w33m69 |