A study of titanium dioxide conductive thin films by sputter method in Ar+H2 atmosphere
碩士 === 國立聯合大學 === 材料科學工程學系碩士班 === 97 === In this study, TiO2-x thin films was prepared by radio frequency (RF) magnetron sputtering method, using TiO2 as target. The films was deposited at varius H2/Ar flow ratio, working pressure, sputtering power, substrate temperature and substrate bias, under co...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/53487449912769925355 |