Bi-directional Diode

碩士 === 國立臺灣大學 === 電機工程學研究所 === 97 === Until today, gate length of MOSFET have scaled down to nano-scale. As semiconductor process keep regenerating, ITRS predict that the channel length will smaller than sixteen nano. Process technologic followed technic of nowadays will not keep scaling down. In or...

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Bibliographic Details
Main Authors: Yi-Hang Chien, 簡意航
Other Authors: 鄭鴻祥
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/32564257253440695930