Application of UV/O3 to Mineralize NMP in Aqueous Solution
博士 === 國立中山大學 === 環境工程研究所 === 97 === This study evaluated the performance of advanced oxidation processes that combines UV, O3 and H2O2 to mineralize N-methyl-2-pyrrolidinone (NMP) in an aqueous solution. As a photoresist stripper, NMP is widely used in the semi-conductor and optoelectronics industr...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/nr643w |