Silicon-based Optical Waveguide Using Undercut Etching Method

碩士 === 國立中山大學 === 光電工程學系研究所 === 97 === In this work, a novel type of optical waveguide, namely two-step undercut-etching Si waveguide (TSUESW), fabricated in Si-substrate is proposed and demonstrated. All this waveguide processing is based on two step of SF6-based dry etching method. In the first st...

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Bibliographic Details
Main Authors: Jia-rung Shie, 謝佳榮
Other Authors: Yi-Jen Chiu
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/nb3j88