Research on the properties of SiOx films deposited by helicon plasma enhanced chemical vapor deposition using HMDSO
碩士 === 國立中央大學 === 光電科學研究所 === 97 === Helicon plasma source is one of the high-density plasma sources. SiOx thin films were deposited by PECVD with Helicon plasma source. Different ratios of N2O (or O2) and Ar gas mixture were used in the depositing processes. The optical properties, chemical bond pr...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/05604527971175432033 |