Fabrication and Optoelectronic Properties ofLow-Dimensional SiGe Nanostructures by UsingSelf-assembled Nanomasks

碩士 === 國立中央大學 === 材料科學與工程研究所 === 97 === In the present study, large-area Si nanotips were fabricated by selective chemical etching of self-assembled Ge quantum dots on Si. Taking advantage of the relatively low etching rate, high-density Ge dots act as virtual nanomasks for the underlying Si substra...

Full description

Bibliographic Details
Main Authors: Bo-Lun Wu, 吳伯倫
Other Authors: Sheng-Wei Lee
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/50416886224720264631

Similar Items