The XPS Analysis of GaN by N2+ Ion Beam Nitridation GaAs

碩士 === 國立中央大學 === 材料科學與工程研究所 === 97 === Abstract   Because of its good physical properties, GaN becomes an important m- aterial that is widely used on various dimensions. Nowadays, many techniq- ues are taken to produce GaN, such as MOCVD, MBE, etc. However, due to there are large lattice mismatch b...

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Main Authors: Ron-Kai Hsu, 許榮凱
Other Authors: Biing-Hwa Yan
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/mbjnjc
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spelling ndltd-TW-097NCU051590012019-05-15T20:32:02Z http://ndltd.ncl.edu.tw/handle/mbjnjc The XPS Analysis of GaN by N2+ Ion Beam Nitridation GaAs 離子束氮化砷化鎵生成氮化鎵之X光光電子能譜儀分析 Ron-Kai Hsu 許榮凱 碩士 國立中央大學 材料科學與工程研究所 97 Abstract   Because of its good physical properties, GaN becomes an important m- aterial that is widely used on various dimensions. Nowadays, many techniq- ues are taken to produce GaN, such as MOCVD, MBE, etc. However, due to there are large lattice mismatch between substrates and GaN layer, by using nitridation of GaAs to form a buffer layer before producing GaN on the subs- trate is an alternative in recent years.   In the experiment, ion beam nitridation of GaAs using two different vol- tages of N2+ ion beam fixed in 10 keV and 5 keV , the ion beam current dens- ity from 2 to 4 μA and fixed three different doses are used to nitridation of GaAs. An X photoelectron spectroscopy (XPS) is used to do the analysis here. Argon ion beam clean carbon and oxygen pollutants form a surface of gallium -rich on gallium arsenide. According to the analysis, it is found that the higher the voltage of gallium ion beam is, the thicker the film of GaN is, and the gre- ater the dose is, the film of GaN is also thicker.   Compared with other references, the thickness of GaN films in this expe- riment has little difference with their results. Therefore, the experiment para- meter of the thickness of GaN film in this experiment is reliable. Biing-Hwa Yan Chin-Shuang Lee 顏炳華 李敬萱 2008 學位論文 ; thesis 62 zh-TW
collection NDLTD
language zh-TW
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description 碩士 === 國立中央大學 === 材料科學與工程研究所 === 97 === Abstract   Because of its good physical properties, GaN becomes an important m- aterial that is widely used on various dimensions. Nowadays, many techniq- ues are taken to produce GaN, such as MOCVD, MBE, etc. However, due to there are large lattice mismatch between substrates and GaN layer, by using nitridation of GaAs to form a buffer layer before producing GaN on the subs- trate is an alternative in recent years.   In the experiment, ion beam nitridation of GaAs using two different vol- tages of N2+ ion beam fixed in 10 keV and 5 keV , the ion beam current dens- ity from 2 to 4 μA and fixed three different doses are used to nitridation of GaAs. An X photoelectron spectroscopy (XPS) is used to do the analysis here. Argon ion beam clean carbon and oxygen pollutants form a surface of gallium -rich on gallium arsenide. According to the analysis, it is found that the higher the voltage of gallium ion beam is, the thicker the film of GaN is, and the gre- ater the dose is, the film of GaN is also thicker.   Compared with other references, the thickness of GaN films in this expe- riment has little difference with their results. Therefore, the experiment para- meter of the thickness of GaN film in this experiment is reliable.
author2 Biing-Hwa Yan
author_facet Biing-Hwa Yan
Ron-Kai Hsu
許榮凱
author Ron-Kai Hsu
許榮凱
spellingShingle Ron-Kai Hsu
許榮凱
The XPS Analysis of GaN by N2+ Ion Beam Nitridation GaAs
author_sort Ron-Kai Hsu
title The XPS Analysis of GaN by N2+ Ion Beam Nitridation GaAs
title_short The XPS Analysis of GaN by N2+ Ion Beam Nitridation GaAs
title_full The XPS Analysis of GaN by N2+ Ion Beam Nitridation GaAs
title_fullStr The XPS Analysis of GaN by N2+ Ion Beam Nitridation GaAs
title_full_unstemmed The XPS Analysis of GaN by N2+ Ion Beam Nitridation GaAs
title_sort xps analysis of gan by n2+ ion beam nitridation gaas
publishDate 2008
url http://ndltd.ncl.edu.tw/handle/mbjnjc
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