Improvement of High Dielectric Materials and Semiconductor-Insulator Interfaces for Ge and III-V High Performance MOSFETs
博士 === 國立交通大學 === 電子工程系所 === 97 === In this thesis we have extensively investigated the deposition of various high-k dielectric films—including HfOxNy, Al2O3, and Gd2O3—onto the bulk Ge and GaAs substrates and the electrical characteristics of the devices with these developed high-k dielectric films...
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| Format: | Others |
| Language: | en_US |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/48874631081493017651 |