The effects of annealing temperature on the microstructure of nanoindented Cu/Si thin films
碩士 === 國立成功大學 === 機械工程學系碩博士班 === 97 === This study explores the affections to Cu/Si film results from annealed temperature. First, make 800 nm depth and 1800 nm depth Cu film separately on (100) Si wafer in the experiment. And use electron beam lithography system, EBL to sculpt one matrix image on t...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/45501661645722177065 |