Preparation of chromium oxynitride thin films by physical vapor deposition using air as a reactive gas
碩士 === 國立中興大學 === 材料科學與工程學系所 === 97 === It has been reported that preparation of chromium oxynitride (CrNxOy) thin films by physical vapor deposition (PVD) often requires the vacuum environment to achieve low base pressures and to avoid the influence of residual air. It usually takes much time to ac...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/09680871011249285592 |