Study on the Fabrication of a-Si:H Thin Film Solar Cell under Different Radio Frequency and Hydrogen Flow Rate
碩士 === 國立中興大學 === 光電工程研究所 === 97 === In this thesis, thin films are deposited by plasma enhanced chemical vapor deposition (PECVD) under pressure 1torr and at temperature 350℃ with RF power 20W. We investigate the characteristics of thin films with various H2 diluted ratio of silane from 0 to 100 un...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Online Access: | http://ndltd.ncl.edu.tw/handle/10844839741197401050 |