A Study on the Effects of RF Plasma Treatment to LPCVD ZnO Growth and Optical Performance of Deposits
碩士 === 龍華科技大學 === 工程技術研究所 === 97 === In this study, a unique fabrication technique, with combination of hot-wall low pressure chemical vapor deposition (LPCVD), sputtering of buffer layers, and RF plasma surface treatment experiment, was developed and used to produce zinc oxide films with outstandin...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/16523168513133842170 |