The Study of0.95(Na0.5 Bi0.5)TiO3-0.05BaTiO3 Thin Film Prepared by RF magnetron Sputtering

The Study of0.95(Na0.5 Bi0.5)TiO3-0.05BaTiO3 Thin Film Prepared by RF magnetron Sputtering

碩士 === 高苑科技大學 === 電子工程研究所 === 97 === In this study, 0.95 (Na0.5Bi0.5)TiO3 - 0.05 BaTiO3 + 1wt% Bi2O3 (NBT-BT3) thin films were deposited on SiO2/p-Si(100) and Pt/Ti/SiO2/p-Si(100) substrates using RF magnetron sputter method and the MFIS and MFM structures would also be fabricated. The effects of v...

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Bibliographic Details
Main Authors:	Bing-Xun Wang, 王秉勳
Other Authors:	Chien-Chen Diao
Format:	Others
Language:	zh-TW
Published:	2009
Online Access:	http://ndltd.ncl.edu.tw/handle/84039355890143113406

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