The Study of0.95(Na0.5 Bi0.5)TiO3-0.05BaTiO3 Thin Film Prepared by RF magnetron Sputtering
碩士 === 高苑科技大學 === 電子工程研究所 === 97 === In this study, 0.95 (Na0.5Bi0.5)TiO3 - 0.05 BaTiO3 + 1wt% Bi2O3 (NBT-BT3) thin films were deposited on SiO2/p-Si(100) and Pt/Ti/SiO2/p-Si(100) substrates using RF magnetron sputter method and the MFIS and MFM structures would also be fabricated. The effects of v...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/84039355890143113406 |