The Characterization of Aluminum Fluoride Thin Films for DUV Application
碩士 === 輔仁大學 === 物理學系 === 97 === A novel and effective process to fabricate high quality fluoride thin films was presented. Aluminum fluoride films deposited by a conventional thermal evaporation at around room temperature with IAD using SF6 as a working gas were investigated. In this study, the opti...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/50798548143398276412 |