A Study on the Surface Treatment of the Thin Films by Atmospheric Pressure Plasma Jet
碩士 === 中原大學 === 機械工程研究所 === 97 === Polyimides (PI) have been widely used for semiconductor and opto-electronic industries due to their stability and durability. A few years earlier, people used chemical wet-etching to etch thin films, but there are shortcomings such as isotropy, low value of depth t...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/24117121610238329560 |