The characteristics study of TiO2 thin films deposited by D.C. reactive magnetron sputtering system
碩士 === 中原大學 === 電子工程研究所 === 97 === TiO2 thin films were grown on Si(100) substrates using D.C. reactive magnetron sputtering system. The dependence of film quality on growth parameters, such as substrate temperature, total sputtering pressure and annealing temperature. There are correlations of thin...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/49418163740059755659 |