Effect of LCVD Process Parameters on the Properties of Tungsten Thin Films Using Tungsten Hexacarbonyl Precursor
碩士 === 長庚大學 === 化工與材料工程研究所 === 97 === Tungsten (W) thin films has many applications in industry, including the organic material urges nearly pharmaceutical, only such functions as refracting material and wire are mended. This paper thesis utilize LCVD system photolytic by laser beam W(CO)6 deposit W...
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| Format: | Others |
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2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/29033277864775150937 |