Nanosize fabrication using thermal lithography technique of phase change films
碩士 === 元智大學 === 光電工程研究所 === 96 === A lithography technique called “thermal lithography” was proposed for fabricating nanometer-sized structures. A focused laser spot was utilized to generate a spatially confined hot area in a photoresist film. In this study, we use the thermal lithography technique...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/07271954905292438068 |
| Summary: | 碩士 === 元智大學 === 光電工程研究所 === 96 === A lithography technique called “thermal lithography” was proposed for fabricating nanometer-sized structures. A focused laser spot was utilized to generate a spatially confined hot area in a photoresist film. In this study, we use the thermal lithography technique and etching to get a nanoscale sample. And then we describe the fabrication of 140 nm size spacewidth and 36 nm size depth on a photoresist film using different adjustment. The most important thing is the technique will be applied to the mastering process in commercial because it is low-cost and time-saving.
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