Nanosize fabrication using thermal lithography technique of phase change films
碩士 === 元智大學 === 光電工程研究所 === 96 === A lithography technique called “thermal lithography” was proposed for fabricating nanometer-sized structures. A focused laser spot was utilized to generate a spatially confined hot area in a photoresist film. In this study, we use the thermal lithography technique...
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/07271954905292438068 |