Effect of Substrate Materials on the Properties of TiO2 Films Grown by Atomic Layer Deposition
碩士 === 南台科技大學 === 奈米科技研究所 === 96 === In this study, titanium dioxide (TiO2) films were grown on n+– Si、Ti、Ta and Ni substrates by atomic layer deposition (ALD) at 200~500℃ with TiCl4 and H2O as precursors The surface morphology, crystal structure, and photocurrent of TiO2 films were characterized by...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/96594967097896471913 |