Study of residual stresses of sputteringTi and Ni / Ti thin filmsOn residual stresses of sputtering Ti and Ni / Ti thin films
碩士 === 聖約翰科技大學 === 自動化及機電整合研究所 === 96 === Sputtering thin films become an important technology because of its performance in wide engineering applications. However, residual stresses induced in the deposition processes sufficiently affect the thin film performance. In this work, residual stresses of...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/09015883177618293911 |