Improvement of Against Oxidation and Electrical Properties of Passivated Cu(Hf) Thin Film
碩士 === 國立虎尾科技大學 === 材料科學與綠色能源工程研究所 === 96 === In this study, the characteristics of Cu(Hf) alloy thin films and its applications as the materials of interconnect were investigation. Driven by copper has much lower electrical resistivity and higher electron migration (EM) resistance than that of alum...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/5vhzmm |