The Investigation of Characteristic and Reliability for 90nm SOI CMOSFETs with Strain Technology
碩士 === 國立高雄大學 === 電機工程學系--先進電子構裝技術產業研發碩 === 96 === In this thesis, we investigate the impact of the strain technology on Characteristic and Reliability for 90nm SOI CMOSFET with Strain Technology. For nMOSFET, device driving capability can be improved by tensile CESL especially with thicker thicknes...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/65469770568333916934 |