Turn-on Transient Analysis and Hysteresis Behavior of PD SOI MOS Devices Using 2D simulation

碩士 === 國立臺灣大學 === 電子工程學研究所 === 96 === This thesis reports the analysis of the turn on transient and hysteresis behavior of 40 nanometers PDSOI device consider the STI induce mechanical stress。 Chapter 1 introduces the characteristic of the SOI Device and the shallow trench isolation(STI)induce mec...

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Bibliographic Details
Main Authors: Hung-Che Hsieh, 謝宏哲
Other Authors: 郭正邦
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/02484971252250732776