An Aerial Image Simulator for Fast Critical Dimension Estimation of Lithography Process
碩士 === 國立清華大學 === 電機工程學系 === 96 === As the feature sizes in today’s semiconductor process become smaller, process variations have great influences on the performance of integrated circuit (IC). Evaluating IC’s performance before mass production is quite important and optical lithography is the key s...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Online Access: | http://ndltd.ncl.edu.tw/handle/09691820464113702440 |